Work

34nm pitch orthogonal pillar patterning enabled by different mask geometries

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034675

Authors: Hemant Kumar Raut, Mahmudul Hasan, Arijit Das, Murat Pak

Institution: IMEC

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404632567

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Cites: 6

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Related to: 10