Work

Development of laser-assisted CD correction system in EUV masks

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034358

Authors: Jongkeun Oh, Geonhui Park, YongWoo Kim, JongJu Park, JungJin Kim, SangHee Lee, Hyun Yoon, Seryeyohan Cho, KiHoon Choi

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404632580

FWCI:

Cites: 5

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Related to: 10