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New applications on multi-beam mask writers to enable mask-making in 3nm and beyond

Year: 2024

Type: conference-paper

Source: SPIE Photomask Technology Conference

DOI: 10.1117/12.3034678

Authors: Ta Wei Ou, Wing Kwan Ho, Tung-San Lai, Jeremy L.C. Lu, Alan C.L. Chen, Alexander Egl, Matthias Kühmayer, Brenner Florian

Institutions: Taiwan Semiconductor Manufacturing Company (Taiwan), IMS Nanofabrication (Austria)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4404745454

FWCI: 1.612

Cites: 5

Cited by: 2

Related to: 10