Work

Area-Selective Molecular Layer Deposition of Alucone on Photoresist for Enhanced Pattern Transfer

Year: 2024

Type: article

Source: Chemistry of Materials

DOI: 10.1021/acs.chemmater.4c02521

Authors: Long Liu, Yue Zhang, Wenda Bao, Weixuan Zeng, Xiaoyun Yu, Jiayi Chen, Shisheng Xiong

Institution: Fudan University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G571593048

OpenAlex ID: W4404755053

FWCI: 0.514

Cites: 42

Cited by: 5

Related to: 10