Halogen Radical-Enabled Dearomatization of N-Arylpropiolamides via Photoinduced Sequential Halogenation/Spirocyclization/Oxidation Process
Year: 2024
Type: article
Source: The Journal of Organic Chemistry
Authors: Wenkun Luo, Wenkun Luo, Huiling Jiang, Weiwei Luo, Weiwei Luo, Chao Liu, Jun Zhou
Institution: Changsha University of Science and Technology
Language: English
Subfield: Organic Chemistry
Field: Chemistry
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4405025084
