Work

Dual focus wavefront tilting silicon nitride-based metalenses manufactured using deep-ultraviolet scanner lithography

Year: 2024

Type: article

Abstract: We present a dual focus wavefront tilting metalens, a lens of a few micrometers thick that compensates for incidence angles of ±5° and focuses them to the same target. The metalens comprises an array of Si3N4 nanopillars. We manufactured the metalens using 193 nm deep-ultraviolet scanner lithography, suitable for high-volume manufacturing. Using this metalens, we demonstrate a proof-of-concept for chip-to-free-space coupling by directing light from one fibre collimator at +5° towards a mirror and recoupling this light into another fibre collimator at -5°. The metalens achieved a focusing efficiency of 9.4%. This efficiency has the potential to be improved to 64%. The metalens can be integrated into photonic circuits for enhanced coupling with distant objects. This work paves the way for further miniaturization of gas and metrology sensors.

Source: Optics Express

DOI: 10.1364/oe.545928

Authors: David De Vocht, Alonso Millan-Mejia, Angel Savov, Yuqing Jiao, Erwin Bente

Institution: Eindhoven University of Technology

Language: English

Topic: Metamaterials and Metasurfaces Applications

Subfield: Electronic, Optical and Magnetic Materials

Field: Materials Science

Domain: Physical Sciences

Open Access status: gold

Estimated APC paid: $2,270

Funder: Nederlandse Organisatie voor Wetenschappelijk Onderzoek