Work

Next step in Moore’s law: high NA EUV system overview and first imaging and overlay performance

Year: 2024

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.24.1.011009

Authors: Jan van Schoot, Rob van Ballegoij, Hans Butler, Eelco van Setten, Guido Schiffelers, Wim Bouman, Simon van Gorp, Karl Umstadter, Joerg Zimmermann, Daniel Golde, Jens Timo Neumann, Paul Graeupner

Institutions: ASML (Netherlands), Carl Zeiss (Germany)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405101886

FWCI: 3.588

Cites: 42

Cited by: 35

Related to: 10