Highly stable and conformal Ti–organic thin films from sustainable precursors via atomic/molecular layer deposition towards green energy applications
Year: 2024
Type: article
Abstract: Stable and conformal Ti–organic thin films from titanium isopropoxide and organic precursors (hydroquinone or benzene dicarboxylic acid) via ALD/MLD technique is reported; conformality is verified with lateral high-aspect-ratio structures.
Source: Chemical Communications
DOI: 10.1039/d4cc05425c
Institution: Aalto University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: hybrid
Award: G4902330894
OpenAlex ID: W4405108429
