Work

SEM contour extraction application on OPC model of contact layer

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052691

Authors: Xinyuan Zhang, Miaohong Yao, Shibin Xu, Zheju Yan, Kun Ren, Yongyu Wu, Dawei Gao, Ken Chen, Xiangshang Zhu, Chenwei Sun, Feng Shao

Institutions: Zhejiang University, Siemens (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405234915

FWCI:

Cites: 4

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Related to: 10