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Achieving high-accuracy and noise-robust process window analysis through stepwise regression

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052738

Authors: Fuxun Chen, Zeyang Chen, Chaoyi Zheng, Dong Ni, Dawei Gao, Guodong Zhou

Institution: Zhejiang University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405234960

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Cites: 4

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Related to: 10