Work

Enabling source and mask optimization by a dynamic aberration imaging model across the full exposure field

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052955

Authors: Zhaoxuan Li, Miao Yuan, He Yan, Zhen Li, Yuqing Chen, Yanqiu Li

Institution: Beijing Institute of Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235207

FWCI:

Cites: 5

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Related to: 10