Work

Source-mask co-optimization study for 7 nm metal layer patterns with 80 nm minimum pitch

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052968

Authors: Ying Li, Li Yanli, Wang Qi

Institution: Fudan University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4405235219

FWCI: 0.778

Cites: 5

Cited by: 1

Related to: 10