Work

An effective methodology of filter, measure, and align SEM image in model calibration

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052591

Authors: Chihi-Li (Julius) Chen, Ting Wang, Jifeng Miao, He Li, Changqi Sun, Dawen Yang, Pinhong Lin, Xiaodong Meng

Institution: Tsinghua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235379

FWCI:

Cites: 2

Cited by:

Related to: 10