Work

Source-mask co-optimization study for typical EUV design rule patterns with 40nm minimum pitch

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052439

Authors: Qi Wang, Xianhe Liu, Qiang Wu, Ying Li, Yanli Li

Institution: Fudan University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4405235729

FWCI:

Cites: 6

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Related to: 10