Work

Wiener-Padé model for lithographic resist modeling

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3053047

Authors: Chunxiao Mu, Song Zhang, David H. Wei, Hao Jiang, Shiyuan Liu

Institution: Huazhong University of Science and Technology

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235747

FWCI: 0.779

Cites: 5

Cited by: 1

Related to: 10