Work

Optical critical dimension accuracy improvement through TEM uncertainty reduction

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3053021

Authors: Lin Du, Kailin Ren, Yang Xu, Wenzhan Zhou, Biqiu Liu, Yu Zhang, Yuyang Bian

Institutions: Shanghai University, Shanghai Huali Microelectronics (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235757

FWCI:

Cites: 3

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Related to: 10