Work

Investigation of mask thickness effects and their significance for the 28nm node and beyond

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3053135

Authors: Hong Chen, Lijie Wei, Han Bao, Zhong Shu, Yuan He

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235798

FWCI: 0.781

Cites: 9

Cited by: 1

Related to: 10