Work

Study on EUV mask blank inspection with multi-wavelength high harmonic generation EUV source

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3053100

Authors: Yingxiao Li, Zhinan Zeng

Institutions: Shanghai Institute of Optics and Fine Mechanics, Shanghai Zhangjiang Laboratory, Zhangjiang Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235829

FWCI: 0.806

Cites: 4

Cited by: 1

Related to: 10