Work

Development of a synchrotron-based EUV microscope for actinic mask inspection

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3053151

Authors: Shuying Deng, Jinjiang Fu, Zhenjiang Xing, Kunyang Li, Zhou Zhou

Institutions: Sun Yat-sen University, Institute of Advanced Light Source Facilities Shenzhen

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405235841

FWCI: 1.557

Cites: 21

Cited by: 2

Related to: 10