Work

TransUNet-based end-to-end proximity effect correction for electron beam lithography

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3053060

Authors: Hongwei Huang, Haolan Wang, Yuyang Liu, Sikun Li

Institutions: Shanghai University, Shanghai Institute of Optics and Fine Mechanics, University of Chinese Academy of Sciences

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405236029

FWCI:

Cites: 16

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Related to: 10