Work

Inverse lithography based on a physics-driven deep learning approach

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052735

Authors: Rui-xiang Chen, Yang Zhao, Rui Chen

Institution: Sun Yat-sen University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4405236078

FWCI:

Cites: 11

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Related to: 10