Work

The application of multiple patterning solutions based on process window analysis in lithography

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052935

Authors: Xiaodong Meng, Cai Chen, Qin Wang, Lei Chen

Institution: Tsinghua University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4405236090

FWCI: 0.78

Cites: 8

Cited by: 1

Related to: 10