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An efficient way towards massive CD-SEM metrology recipes based on line scan analysis: release your hands

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052328

Authors: Zhiping Mou, Kun Ren, Dawei Gao, Shibin Xu, Yanjiang Li, Chenwei Sun, Bo Pang

Institutions: Zhejiang University, Siemens (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405236116

FWCI:

Cites: 5

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Related to: 10