Work

A method of combing optical proximity correction and design layout optimization to improve process window

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3055171

Authors: peter wang, Anne Zhang, trinity xu, zhimang shao, lucas ni, xumei zhao, zewei zheng, michael liu, chen shen, coco chen, wenhui chen

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

SDG: Industry, innovation and infrastructure

Open Access status: closed

OpenAlex ID: W4405236127

FWCI:

Cites: 3

Cited by:

Related to: 10