Work

Research on optical proximity correction with embedded coordinate convolution module

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052204

Authors: Yongkang Liu, Wei Zhao, Ruixiang Yan, Kai Ni, Yuandong Gu, Jianlin Li

Institutions: Shanghai University, Shanghai Industrial Technology Institute

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405236150

FWCI:

Cites: 9

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Related to: 10