Work

Accurate SEM contour-based measurement and analysis of SRAM patterns for enhanced design optimization

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052330

Authors: Yongyu Wu, Miaohong Yao, Shibin Xu, Kun Ren, Dawei Gao, Xiaoci Li, Ken Chen, Qijian Wan, Chunshan Du

Institutions: Zhejiang University, Siemens (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405236152

FWCI:

Cites: 6

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Related to: 10