Work

EUV lithography imaging modeling and calculation based on full-vector beam propagation method

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052229

Authors: Zhilong Zhong, Jiamin Liu, Pinxuan He, Hao Jiang, Honggang Gu, Shiyuan Liu

Institutions: Huazhong University of Science and Technology, Optics Valley Laboratory

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405236221

FWCI: 1.557

Cites: 10

Cited by: 2

Related to: 10