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Edge placement error analysis through backscattered electron imaging

Year: 2024

Type: conference-paper

Source: International Workshop on Advanced Patterning Solutions (IWAPS)

DOI: 10.1117/12.3052520

Authors: Yuyang Bian, Na Li, Wenzhan Zhou, Biqiu Liu, Yu Zhang, Rong Huang, Jiawang Song, Qiang Zhou, Siqun Xiao, Or Zruya, Lee Rubinstein, Aner Avakrat, Jovian Delaforce, Antoine Legrain, Qing Ye, Frederic Robert, Amir Rosen, Michael Shifrin

Institution: Shanghai Huali Microelectronics (China)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405237730

FWCI:

Cites: 6

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Related to: 10