Work

Intrinsically photosensitive polyimide photoresist and its double crosslinking mechanism

Year: 2024

Type: article

Source: Chemical Communications

DOI: 10.1039/d4cc04749d

Authors: Peng Yang, Haiping Yu, Yuting Zhu, Xiaonuo Liu, Pin Liu, Xu Wang, Bo Tang

Institutions: Shandong Normal University, Second Artillery General Hospital of Chinese People's Liberation Army, Centre de Recherches Interdisciplinaires sur les Mondes Ibéro-américains Contemporains

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Shandong Province, Taishan Scholar Project of Shandong Province

Awards: G3892728863, G7645227748, G7860413981

OpenAlex ID: W4405253239

FWCI: 1.249

Cites: 27

Cited by: 12

Related to: 10