Structural and piezoelectric properties of chemical vapor deposited AlN films on metallic substrates:DOE approach
Year: 2019
Type: conference-paper
Source: HAL
Institution: Science et Ingénierie des Matériaux et Procédés
Language: English
Subfield: Biomedical Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4405299505
