Work

A TCAD Study of Analog Figures of Merit of Ultrathin Body and Buried Oxide SOI MOSFETs with Non-LDD Source/Drain Extensions

Year: 2024

Type: conference-paper

Source: International Symposium on Semiconductor and Electronic Technology (ISSET)

DOI: 10.1109/isset62871.2024.10779687

Authors: Yeye GUo, Man Li, Guoao Zhou, Mingxiang Wang, Dongli Zhang, Huaisheng Wang, Chen Shen, Ding Gong

Institution: Soochow University

Language: English

Topic: Advancements in Semiconductor Devices and Circuit Design

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405305128

FWCI:

Cites: 17

Cited by:

Related to: 10