Investigating the effects of etching systems and low-temperature thermal processing on hafnium zirconium oxide thin film properties
Year: 2024
Type: article
DOI: 10.1116/6.0004040
Authors: Wen-Hsi Lee, Edward Kuo, Chia-Nung Hung, Tai-Chen Kuo
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4405370704