Effect of Pixel Size and Lateral Distortion on the Accuracy of Stitching Interferometry for High-Precision X-ray Mirrors
Year: 2024
Type: article
Abstract: Stitching interferometry is essential for X-ray mirror metrology where lateral distortion and pixel size are critical factors influencing its accuracy. Simulations and experiments reveal that 1% error in pixel size causes a 2% deviation in the radius of curvature. After correcting pixel size, the stitching profile error of an elliptical mirror reduces from 2 μm to 250 nm (peak-to-valley). Lateral distortion correction can further reduce retrace errors. For stitching measurements using small sub-apertures, distortion correction can be minor if the average pixel size has been corrected and the actual distortion along the stitching direction is small.
Source: Optics Express
DOI: 10.1364/oe.549138
Language: English
Subfield: Computer Vision and Pattern Recognition
Field: Computer Science
Domain: Physical Sciences
Open Access status: gold
Estimated APC paid: $2,270
OpenAlex ID: W4405431976