Work

Source optimization method employing dynamic polarization aberration model for high-NA EUVL

Year: 2024

Type: article

Source: Applied Optics

DOI: 10.1364/ao.540442

Authors: Zhaoxuan Li, Miao Yuan, Zhen Li, He Yang, Weichen Huang, Yanqiu Li

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Natural Science Foundation of China

Award: G2214122415

OpenAlex ID: W4405518080

FWCI:

Cites: 27

Cited by:

Related to: 10