Work

Hollow-type plasma absorption probe for measurement of electron density in low pressure plasmas: a sheath thickness–insensitive technique

Year: 2024

Type: article

Source: Plasma Sources Science and Technology

DOI: 10.1088/1361-6595/ada0da

Authors: SangHo Lee, SiJun Kim, InYong Park, GeonWoong Eom, Byonghoon Seo, Min Hur, WooSeok Kang, ShinJae You, Dae-Woong Kim

Institutions: Chungnam National University, Korea Institute of Machinery & Materials, Embry-Riddle Aeronautical University Daytona Beach Florida Campus, Embry–Riddle Aeronautical University

Language: English

Topic: Plasma Diagnostics and Applications

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Ministry of Trade, Industry and Energy

OpenAlex ID: W4405536196

FWCI:

Cites: 26

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Related to: 10