Work

High‐Yield Production of High‐κ/Metal Gate Nanopattern Array for 2D Devices via Oxidation‐Assisted Etching Approach (Small 51/2024)

Year: 2024

Type: article

Abstract: Nanopattern Arrays High-performance high-?/metal gate (HKMG) structures are crucial for advanced electronics. In article number 2403187, Ziao Tian, Zengfeng Di, and co-workers introduce an innovative oxidation-assisted etching method for large-scale, high-yield HKMG arrays with 150 nm resolution. By controlling aluminum to alumina transition on 2D materials, a process compatible with existing semiconductor techniques is achieved, promising for VLSI circuit applications and nanoelectronics advancement.

Source: Small

DOI: 10.1002/smll.202470378

Authors: Weida Hong, Jiejun Zhang, Daobing Zeng, Chen Wang, Zhongying Xue, Miao Zhang, Ziao Tian, Zengfeng Di

Institutions: Chinese Academy of Sciences, Shanghai Institute of Microsystem and Information Technology, University of Chinese Academy of Sciences

Language: English

Topic: Nanofabrication and Lithography Techniques

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: bronze

OpenAlex ID: W4405573909

FWCI:

Cites:

Cited by:

Related to: 10