Simultaneously Improved Electrical Characteristics of Ge n/p-FinFETs and Inverter With Oxidized Alloy-Like Hafnium Nitride Interfacial Layer
Year: 2024
Type: article
Source: IEEE Electron Device Letters
Authors: Dun-Bao Ruan, Kuei-Shu Chang-Liao, Cheng-Han Li, Zefu Zhao, Kai-Jhih Gan
Institutions: Fuzhou University, National Tsing Hua University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G1606589457, G8000196001, G8453253503
OpenAlex ID: W4405632519
