Ultra-Low Loss Alumina and Silicon Nitride Waveguides in the Blue Through Multipass Lithography
Year: 2024
Type: conference-paper
Abstract: High surface scattering loss is a major hindrance for low-loss integrated platforms at visible wavelengths. By optimizing our e-beam lithography process through a multi-pass technique, we achieve loss of 4.9 and 0.8 dB/cm at 450 nm in highly confining silicon nitride and alumina waveguides respectively.
Source: IEEE Photonics Conference
Authors: N. G. Pruiti, E. McKay, P. Reynolds, M. Sorel
Institution: University of Glasgow
Language: English
Topic: Photonic and Optical Devices
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: green
OpenAlex ID: W4405633231