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Geometry-Based Curvilinear Mask Process Correction for Enhanced Pattern Fidelity, Contrast, and Manufacturability

Year: 2024

Type: article

Source: IEEE Transactions on Semiconductor Manufacturing

DOI: 10.1109/tsm.2024.3521368

Authors: Chun-Hung Liu, Ze-An Ding

Institution: National Taipei University

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: National Science and Technology Council

Awards: G1453649523, G3861449935, G8336643081

OpenAlex ID: W4405717926

FWCI: 0.312

Cites: 34

Cited by: 3

Related to: 10