Work

Towards Scalable Aligned Two-Photon Lithography for Photonic Integration

Year: 2024

Type: conference-paper

Source: IEEE CPMT Symposium Japan (ICSJ)

DOI: 10.1109/icsj62869.2024.10804736

Authors: Trappen Mareike, Blaicher Matthias, Hoose Tobias, Lindenmann Nicole, Dottermusch Stephan, Richter Benjamin, Bertoncini Andrea, Thiel Michael

Institution: Nanoscribe (Germany)

Language: English

Topic: Nonlinear Optical Materials Studies

Subfield: Biomedical Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Bundesministerium für Bildung und Forschung

Award: QSens: Enabling-Technologien für skalierbare Diamant-Quantensensoren (QSCALE) - F

OpenAlex ID: W4405755351

FWCI:

Cites: 10

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Related to: 10