Work

Enhanced tunneling electroresistance in ferroelectric tunnel junctions achieved through dual interface control

Year: 2024

Type: article

Source: Applied Physics Letters

DOI: 10.1063/5.0220789

Authors: Zhijun Ma, Qi Zhang, Zeyu Zhang, Yizhong Guo, Yongqi Ruan, Zhiwei Wang, Peng Zhou, Mikayla Lord, Ji Luo, Shuai Liu, Nagarajan Valanoor, Tianjin Zhang

Institutions: Hubei University, Commonwealth Scientific and Industrial Research Organisation, UNSW Sydney, CSIRO Manufacturing, Guangdong University of Technology

Language: English

Topic: Ferroelectric and Negative Capacitance Devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Hubei Province

Awards: G2892849073, 共振隧穿铁电隧道结巨TER效应与存储特性研究, G4132110476

OpenAlex ID: W4405798829

FWCI: 0.208

Cites: 23

Cited by: 2

Related to: 10