Work

Optimization of ReRAM using Mist-CVD GTO films: Importance of substrate thickness, aging, and preparation procedure for improving switching ratio

Year: 2024

Type: conference-paper

Source: IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK)

DOI: 10.1109/imfedk64776.2024.10814401

Authors: Seiya Nakagawa, Kosuke Oyasu, Hidenori Kawanishi, Mutsumi Kimura, Tokiyoshi Matsuda

Institutions: Ryukoku University, Kindai University

Language: English

Topic: Advanced Memory and Neural Computing

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405907760

FWCI:

Cites: 2

Cited by:

Related to: 10