Work

Underlayer material design for extreme ultraviolet negative-tone development photolithography process by controlling photoresist-underlayer intermixing

Year: 2024

Type: article

Source: Journal of Micro/Nanopatterning Materials and Metrology

DOI: 10.1117/1.jmm.23.4.044602

Authors: Seung Won Han, Eunkyoung Byun, Sukmin Kim, Hong Joon Lee, Jingoo Yoon, Yun Ho Kim, Sam-Jong Choi

Institution: Samsung Electronics (South Korea)

Language: English

Topic: Advancements in Photolithography Techniques

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4405948600

FWCI: 0.206

Cites: 17

Cited by: 2

Related to: 10