Amorphous Carbon Monolayer: A van der Waals Interface for High-Performance Metal Oxide Semiconductor Devices
Year: 2024
Type: article
Source: ACS Nano
Authors: Viswanath G. Akkili, Jongchan Yoon, Kihyun Shin, Sanghyun Jeong, Ji-Yun Moon, Jun-Hui Choi, Seung-Il Kim, Ashish A. Patil, Frederick Aziadzo, Jeongbeen Kim, Suhyeon Kim, Dong-Wook Shin, Jung-Sub Wi, Hoon-Hwe Cho, Joon Sik Park, Eui-Tae Kim, Dong-Eun Kim, Jaeyeong Heo, Graeme Henkelman, Kostya S. Novoselov, Choong-Heui Chung, Jae-Hyun Lee, Zonghoon Lee, Sangyeob Lee
Institutions: Hanbat National University, Institute for Basic Science, Ulsan National Institute of Science and Technology, Washington University in St. Louis, Ajou University, Chungnam National University, Pohang University of Science and Technology, Chonnam National University, The University of Texas at Austin, National University of Singapore, Institute for Functional Intelligent Materials, Sungkyunkwan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
Awards: G1532178269, G5628632484, G7956839731
OpenAlex ID: W4405957868