Work

Deposition of single-phase monoclinic Cu2SnS3 thin films on Mo-coated substrates by dual-source fine-channel mist CVD

Year: 2025

Type: article

Source: Japanese Journal of Applied Physics

DOI: 10.35848/1347-4065/ada709

Authors: Hirotaka Maeta, Kazuki Nakashima, Ayaka Kanai, Kunihiko Tanaka

Institution: Nagaoka University of Technology

Language: English

Topic: Chalcogenide Semiconductor Thin Films

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

Funder: Nippon Sheet Glass Foundation for Materials Science and Engineering

OpenAlex ID: W4406154862

FWCI: 0.693

Cites: 32

Cited by: 3

Related to: 10