Work

Facile controlled growth of multilayer h-BN thin films using spaced-confined APCVD and its gate dielectric application

Year: 2025

Type: article

Source: CrystEngComm

DOI: 10.1039/d4ce01138d

Authors: Yajuan Zhao, Liang Shi, Yalong Li, Qian Ma, Jialu Huang, Wenyan Li, Zhen Fu, Haolin Wang

Institutions: Collaborative Innovation Center of Advanced Microstructures, National Laboratory of Solid State Microstructures, Shaanxi University of Science and Technology, Nanjing University, Xidian University

Language: English

Topic: 2D Materials and Applications

Subfield: Materials Chemistry

Field: Materials Science

Domain: Physical Sciences

Open Access status: closed

Funders: National Natural Science Foundation of China, Natural Science Foundation of Shaanxi Province, Basic and Applied Basic Research Foundation of Guangdong Province

Awards: G5237607143, G5708546104, G6560264890, G961527384

OpenAlex ID: W4406167754

FWCI: 0.424

Cites: 49

Cited by: 2

Related to: 10