Work

Optimizing Hafnium Oxide Thin-Film Dielectrics: Developing a Novel Atomic Layer Deposition Recipe

Year: 2024

Type: conference-paper

Source: IEEE International Flexible Electronics Technology Conference (IFETC)

DOI: 10.1109/ifetc61155.2024.10771901

Authors: Matin Forouzmehr, Amit Tewari, Kimmo Lahtonen, Donald Lupo, Paul R. Berger

Institutions: Tampere University, University of Tampere, The Ohio State University

Language: English

Topic: Semiconductor materials and devices

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4406265058

FWCI: 3.224

Cites:

Cited by: 4

Related to: 10