Characteristics of HfO2 Dielectric in Planar and Trench Structured SiC Capacitors
Year: 2024
Type: conference-paper
Authors: Qi-min Huang, Yun-duo Guo, Zhen-yu Wang, An-feng Wang, Xin Qi, Chen-xi Ding, Qing-Chun Zhang, Hong-ping Ma
Institution: Fudan University
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4406460452