Work

Optimization of JFET Doping in the Fabrication of 4H-SiC MOSFETs

Year: 2024

Type: conference-paper

DOI: 10.1109/sslchinaifws64644.2024.10835270

Authors: Hao Liu, Ling Sang, Xiping Niu, Xinyu Li, Yawei He, Zheyang Li, Rui Jin

Language: English

Topic: Silicon Carbide Semiconductor Technologies

Subfield: Electrical and Electronic Engineering

Field: Engineering

Domain: Physical Sciences

Open Access status: closed

OpenAlex ID: W4406460577

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Cites: 7

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Related to: 10