Investigation of the Selectivity during Plasma Etching of the Device Layer of Inertial Micromechanical Systems
Year: 2024
Type: article
Source: Nano- i Mikrosistemnaya Tehnika
Author: N.S. Karanin
Language: English
Subfield: Electrical and Electronic Engineering
Field: Engineering
Domain: Physical Sciences
Open Access status: closed
OpenAlex ID: W4406487923